Ex Parte Ono et al - Page 1



              The opinion in support of the decision being entered                  
              today was not written for publication in a law journal                
              and is not binding precedent of the Board.                            

                     UNITED STATES PATENT AND TRADEMARK OFFICE                      
                                                                                   
                         BEFORE THE BOARD OF PATENT APPEALS                         
                                 AND INTERFERENCES                                  
                                                                                   
                                 Ex parte YUJI ONO                                  
                                        and                                         
                                   RYOICHI OHKURA                                   
                                                                                   
                                Appeal No. 2005-0536                                
                             Application No. 09/940,788                             
                                                                                   
                                      ON BRIEF                                      
                                                                                   
         Before KIMLIN, WALTZ and DELMENDO, Administrative Patent Judges.           
         KIMLIN, Administrative Patent Judge.                                       


                                 DECISION ON APPEAL                                 
              This is an appeal from the final rejection of claims 1-3,             
         all the claims remaining in the present application.  Claim 1 is           
         illustrative:                                                              
              1.  A single wafer type substrate cleaning method of wet-             
         cleaned wafers which are not stored in a cassette, individually,           
         in a sealed cleaning housing, said method consisting of the                
         application of a spin drying treatment to the face of each wafer           
         by supporting and rotating each wafer at high speed in the sealed          
         cleaning housing while an inert gas for preventing oxidation is            
         supplied to the face of the wafer in a drying step, where the              
                                        -1-                                         



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