Ex Parte Fang et al - Page 3

                Appeal 2007-2105                                                                              
                Application 10/762,445                                                                        

                      connected to said source, said Vss connection region being a heavily                    
                      doped region to reduce a Vss resistance;                                                
                             wherein said Vss connection region being situated under said                     
                      bottom of said recess causes said source to have a reduced lateral                      
                      diffusion in said channel region, thereby preventing an increase in a                   
                      drain induced barrier lowering.                                                         
                      The Examiner relies on the following prior art in rejecting the claims:                 
                      Hori                US 6,147,379             Nov. 14, 2000                              
                      Kobayashi           US 6,721,205 B2          April 13, 2004                             
                                                                   (filed Dec. 14, 2000)                      
                      The Examiner rejected claims 1, 2, 4-6, 8, 9, and 11-13 under                           
                35 U.S.C. § 102(b) as anticipated by Hori and Kobayashi1 and claims 7 and                     
                14 under 35 U.S.C. § 103(a) as being unpatentable over Hori and Kobayashi.                    
                      Rather than repeat the arguments here, we make reference to the Brief                   
                and the Answer for the respective positions of the Appellants and the                         
                Examiner.                                                                                     
                      We reverse.                                                                             

                                                   ISSUE                                                      
                      Appellants and the Examiner disagree as to whether Hori discloses the                   
                recited source and Vss connection regions such that the resulting reduced                     
                lateral diffusion of the source prevents an increase in a drain induced barrier               

                                                                                                             
                1  Although the Examiner has based the anticipation rejection of the claims                   
                on both Hori and Kobayashi (Answer 3), it appears that the Examiner                           
                intended to rely on Kobayashi to show that Hori’s bit line connection is                      
                inherently the same as the Vss connection (Answer 9).  Therefore, for the                     
                purpose of this appeal, we consider the rejection to be based only on Hori.                   
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