Appeal No. 95-3583 Application No. 08/185,294 slots, each of the slot [sic, slots] is inclined at an angle of greater than zero degree with respect to a perpendicular line” (Answer, page 3). Suzuki discloses (Figure 1) apparatus for aligning a mask 12 and a wafer 13 during the manufacture of semiconductor circuit elements. As seen in Figures 3 and 4, the mask 12 has a plurality of circuit pattern areas A that are separated by narrow strips S. In Figure 4, the mask 12 and the wafer 13 are shown in an aligned position. In the narrow strip S, the plurality of alignment marks C5 and C6 are located on the mask 12, and the plurality of alignment marks C1 through C4 are located on the wafer 13. According to the examiner (Answer, pages 3 and 4): It would have been obvious to one of ordinary skill in the art at the time the invention was made to use the teaching of Suzuki et al. and modify the system of Wong et al. Such modification of using three slots inclined with respect to each other is merely a duplication of elements as opposed to two marks2 inclined with respect to each other (see fig. 6 of Wong et al) in order to increase the lateral deviation detection accuracy. One skilled in the art would have been motivated to use the teaching of Suzuki et al. for the purpose of precise alignment between an image and reference point yielding to an accurate image recording system. 2This statement gives the impression that the examiner is relying on the sole teachings of Wong. 4Page: Previous 1 2 3 4 5 6 7 NextLast modified: November 3, 2007