Appeal No. 96-0377
Application 07/979,254
Claims 1, 2, 5, 7 through 10, 13 and 15 through 20
stand rejected under 35 U.S.C. § 103 as being unpatentable
over Iwashiro in view of Steinberg.
Claims 6 and 14 stand rejected under 35 U.S.C. § 103
as being unpatentable over Iwashiro and Steinberg, further in
view of Bersin.
Rather than reiterate the arguments of Appellants
and the Examiner, reference is made to the brief, reply brief
and answer for the respective details thereof.
OPINION
We will not sustain the rejection of claims 1, 2,
5 through 10 and 13 through 20 under 35 U.S.C. § 103.
ANALOGOUS ART
Appellants argue that the Steinberg disclosure of a
high speed plasma etching system is not analogous art. Appel-
lants maintain that Steinberg pertains to a non-coaxial plasma
processing apparatus for processing work pieces one at a time,
while Appellants’ apparatus pertains to a coaxial plasma
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