Ex parte POLETTO et al. - Page 2




          Appeal No. 1996-3113                                                        
          Application 08/099,243                                                      



          The Examiner has withdrawn the rejection of claims 13 through               
          17, 20 and 21 in the Examiner’s Answer, paper no. 16.                       
          Therefore, only the rejection of claims 18 and 19 remains                   
          before us.  Both amendments after final rejection have not                  
          been entered, that includes an amendment proposed in Paper No.              
          11, and the amendment proposed and included with the Appeal                 
          Brief, Paper No. 15.                                                        
               Appellants’ invention relates to controlling the                       
          saturation of a bipolar power transistor by sensing the                     
          substrate current, and accordingly controlling the power                    
          transistor’s base current.  In particular, in Figure 3, when                
          power transistor T1 operates in saturation, the voltage across              
          sensing resistor R  (produced by substrate current I ) exceedsS                              S                         
          reference voltage V .  As a consequence, OP1 generates an                   
                             S                                                        
          output current that is fed to an input of the operational                   
          amplifier OP which reduces the driving current I  of                        
                                                          B                           
          transistor T1.                                                              
               Independent claim 18 is reproduced as follows:                         
               18.  A method for controlling saturation of an integrated              
          circuit bipolar transistor in a semiconductor substrate,                    
          comprising the steps of:                                                    

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