Ex parte BEINGLASS et al. - Page 7





               Appeal No. 1997-4027                                                                                             
               Application No. 08/300,111                                                                                       


               ordinary skill in the art would have been motivated to form the reaction chamber of                              

               Anderson which contains very little spacing between the pedestal and the surrounding                             

               preheat ring in order to (1) control the distribution of gases across the wafer, (2) prevent                     

               the reactant gases from flowing to the backside of the reaction chamber and (3) prevent                          

               the dilution of the reactant gases by the gases which are added to the bottom of the                             

                                  2                                                                                             
               reaction chamber.                                                                                                

                      Claim 10 adds the following limitation to claim 1: “including a means for rotating                        

               said susceptor support.”  When the terms in the claims are written in a “means-plus-                             

               function” format we interpret them as the corresponding structure shown in the                                   

               specification or equivalents thereof consistent with 35 U.S.C. § 112, paragraph 6.  In re                        

               Donaldson, 16 F.3d 1189, 1193, 29 USPQ2d 1845, 1848 (Fed. Cir. 1994).  Nowhere                                   

               does claim 10 recite sufficient structural limitations for the                                                   





                        2 We recognize that the ultimate way to prevent the flow of reactive gases to the backside of the       
                reaction chamber is to eliminate the space between the pedestal and the preheat ring.  It is also noted that    
                Anderson’s preferred embodiment calls for the rotation of the pedestal.  The purpose of rotating the            
                substrate is to improve the uniformity of the time averaged physical and chemical environment of the            
                wafer during processing.  (Column 1, lines 43-47).  One of ordinary skill in the art who did not desire the     
                improvements associated with a rotating pedestal would have been motivated to exclude the rotating              
                pedestal from the reaction chamber of Anderson.  See                                                            
                In re Larson, 340 F.2d 965, 969, 144 USPQ 347, 350  (CCPA 1965) (Omission of additional framework               
                and axle which served to increase the cargo carrying capacity of prior art mobile fluid carrying unit           
                would have been obvious if this feature was not desired.); and In re Kuhle, 526 F.2d 553, 555, 188              
                USPQ 7, 9 (CCPA 1975) (deleting a prior art switch member and thereby eliminating its function was an           
                obvious expedient).                                                                                             
                                                             -7-                                                                






Page:  Previous  1  2  3  4  5  6  7  8  9  10  11  12  Next 

Last modified: November 3, 2007