Ex parte KLOCEK - Page 3




               Appeal No. 1998-1665                                                                        Page 3                
               Application No. 08/476,831                                                                                        

                                                           OPINION                                                               

                      Claim 1 is directed to an optical window consisting essentially of a group III-V compound that             
               has been doped with a dopant in a concentration of from about 5 x 10  to about15                                          

               2 x 10  atoms/cc.  The dopant is an element taken from the class consisting of shallow donors.  The16                                                                                                          

               specification indicates that selenium (Se) is a preferred shallow donor dopant (specification, page 6).           
               Claim 1 also limits the level of carbon impurity to less than about 1 x 10  atoms/cc.  The material of the7                                        

               optical window is formed by crystallizing a melt of the doped group III-V compound in a carbon cloth              

               covered graphite crucible subjected to a vertical temperature gradient (specification, pages 8-9).                
               According to the specification, if the carbon level in the melt is greater than 1 x 10  atoms/cc, then an7                              

               increased amount of Se dopant must be used, such as about 5 x 10  atoms/cc (specification, page 6).16                                             

               The specification indicates that increasing the Se doping level results in a lowering of the mobility of the      

               electrons and increased non-uniformity and provides an inferior result (specification, page 8).                   

               Therefore, a boron oxide with a water content of 450-550 ppm is added to the melt to assist in removal            

               of impurities, particularly carbon (Id.).                                                                         

                      The examiner rejects the claims over McNeely in view of Bult.  McNeely describes a process                 

               of forming GaAs semiconductor single crystals including GaAs double-doped with oxygen and                         

               selenium.  McNeely is silent as to the level of carbon.  Bult is added to the rejection for the teaching of       

               using wet boron oxide encapsulant in the growing of a GaAs semiconductor single crystal.  The                     

               examiner concludes from the teachings of McNeely and Bult that one ordinary skill in the art would                








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