Appeal No. 1998-2147
Application No. 08/247,356
BACKGROUND
The invention is directed to a chemical amplification photosensitive
composition comprising (i) an alkali-soluble polyvinylphenol resin having a softening
point of at least 150oC and a weight average molecular weight which is no less than
3,000 and exceeds 8,000 only when the photosensitive composition containing the
resin has sufficient photosensitivity and forms a resist pattern which has sufficient
resolution, (ii) an acid-decomposable compound and (iii) a compound which generates
an acid when exposed to a chemical radiation. Claims 36 and 37 which are
representative of the invention are reproduced below:
36. A chemical amplification photosensitive composition,
comprising:
an alkali-soluble polyvinylphenol resin having a softening point of
at least 150oC and a weight average molecular weight which is no less
than 3,000 and exceeds 8,000 only when the photosensitive composition
containing the resin has sufficient photosensitivity and forms a resist
pattern which has sufficient resolution;
an acid-decomposable compound; and
a compound which generates an acid when exposed to a
chemical radiation.
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