Appeal No. 1999-0865
Application No. 08/468,573
June 8, 1998 after final rejection was approved for entry by the
Examiner.
The disclosed invention relates to an inductively coupled
plasma processing system in which an RF inductive antenna is
utilized to apply RF power into the plasma reactor chamber.
Loading circuitry, which matches the impedance of the source
antenna to the output impedance of the RF power generator, is
provided by a variable capacitance connected between ground and
the connection point between the RF power supply and one end of
the antenna. Tuning circuitry in the form of another variable
capacitance is connected between ground and the other end of the
antenna.
Claim 57 is illustrative of the invention and reads as
follows:
57. A local impedance transforming network for
connection to a transmission antenna having a first terminal
and a second terminal to allow power coupling between a
power supply line connected to said first terminal and said
antenna, comprising:
a first capacitor connected between said first terminal
of said antenna and an electrical node at a predetermined
potential, said first terminal being configured to be
connected to said power supply line; and
a second capacitor connected between said second
terminal of said antenna and said electrical node.
2
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