Appeal No. 2001-0777
Application No. 09/652,893 Page 2
electron beam radiation, a product film and a product
microelectronic device. An understanding of the invention can be
derived from a reading of exemplary claim 14, which is reproduced
below.
14. A process for annealing a substrate coated with a
chemical vapor deposit material comprising:
a) applying to the surface of the substrate the
chemical vapor deposit material; and
b) exposing the chemical vapor deposit material to a
wide, large beam of electron beam radiation from a
substantially uniform large-area electron beam source, to
expose the whole coated substrate simultaneously, under
conditions sufficient to anneal the chemical vapor deposit
material into a film.
The prior art references of record listed by the examiner at
page 3 of the answer are:
Umemura 4,713,258 Dec. 15, 1987
Yamaguchi et al. (Yamaguchi) 4,983,540 Jan. 08, 1991
Livesay 5,003,178 Mar. 26, 1991
Japanese patent abstract of 58-151517, by Yoshii, 7-1985.
The examiner additionally relies on the following prior art
reference:
Yoshii1 60-043814 Mar. 08, 1985
(published Japanese Patent Application)
1 All references to Yoshii in this decision are to the
English language translation of the published Japanese patent
application that is of record. See paper No. 28.
Page: Previous 1 2 3 4 5 6 7 8 9 10 11 Next
Last modified: November 3, 2007