Appeal No. 2001-2146
Application No. 09/270,588
photoexposing the processed patterned positive photoresist layer to form a
photoexposed processed patterned positive layer with enhanced solubility of the
photoexposed processed patterned positive photoresist layer within a solver; and
stripping from the processed target layer the photexposed processed patterned positive
photoresist layer while deploying the solvent.
Since neither Miyashita nor Sato is relied on to show the above missing feature, I concur with
the majority’s view regarding reversal of the examiner’s §103 rejections. However, I do not
approve of and dissociate myself from the majority’s remand order for the reasons indicated
supra, for it wastes the PTO’s critical resources in unproductive exercises.
CHUNG K. PAK ) BOARD OF PATENT
Administrative Patent Judge ) APPEALS AND
) INTERFERENCES
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