Appeal No. 2003-0548 Page 2
Application No. 09/370,599
BACKGROUND
Appellants’ invention relates to an apparatus for processing
a semiconductor substrate. An understanding of the invention can
be derived from a reading of exemplary claims 14 and 40, which
are reproduced below.
14. An apparatus for providing improved processing of
a semiconductor substrate, comprising:
a) a load lock chamber, at least one means for
chemical vapor deposition (CVD), and at least one means
for physical vapor deposition (CVD); and
b) an intermediate substrate transport region
comprising a first substrate transport chamber and a
second substrate transport chamber, wherein one or more
of the at least one means for CVD and one or more of
the at least one means for PVD are disposed on the
second transport chamber.
40. An apparatus for providing improved processing of a
semiconductor substrate, comprising:
a) a load lock chamber,
b) an intermediate substrate transport region
connected to the load lock chamber, the intermediate
subtsrate transport region comprising a first substrate
transport chamber and a second substrate transport
chamber, wherein the second substrate transport chamber
has a lower vaccum than the first substrate transprot
chamber;
c) one or more processing chambers, wherein at
least one of the one or more processing chambers is a
chemical vapor deposition (CVD) processing chamber
disposed on the second substrate transport chamber, and
d) one or more vaccum pumps communicating with the
intermediate substrate transport region and each of the
one or more processing chambers.
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