Ex Parte BRUN et al - Page 2



          Appeal No. 2003-1263                                                        
          Application No. 09/068,999                                                  

               21.  A substrate structure comprising:                                 
               a first part formed on a wafer of material;                            
               at least one second part formed on said wafer in substantially         
          the same plane as said first part and having a same thickness as            
          said first part, said first and second parts having at least one            
          set of opposing edges separated by a spacing; and                           
               at least one joint of insulating material arranged in the              
          spacing and mechanically joining at least a portion of said first           
          and second parts and extending substantially over the entire                
          thickness of said parts,                                                    
               wherein said first and second parts are electrically insulated         
          from one another, and                                                       
               said joint of insulating material provides the only mechanical         
          link between said first and second parts.                                   
               The reference relied on by the examiner is:                            
          Nishizawa et al. (Nishizawa)       5,607,875      Mar. 4, 1997              
               Claims 2, 4, 5, 15 and 21 stand rejected under 35 U.S.C.               
          § 102(e) as being anticipated by Nishizawa.                                 
               Reference is made to the final rejection (paper number 20),            
          the briefs (paper numbers 22 and 24) and the answer (paper number           
          23) for the respective positions of the appellants and the                  
          examiner.                                                                   




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