Ex Parte YANG et al - Page 1




               The opinion in support of the decision being entered                   
               today was not written for publication in a law journal                 
               and is not binding precedent of the Board.                             
                                                               Paper No. 21           


                      UNITED STATES PATENT AND TRADEMARK OFFICE                       
                                                                                     
                         BEFORE THE BOARD OF PATENT APPEALS                           
                                  AND INTERFERENCES                                   
                                                                                     
                               Ex parte SHU-YUAN YANG                                 
                                         and                                          
                                    CHAUCER CHUNG                                     
                                                                                     
                                Appeal No. 2004-0216                                  
                             Application No. 09/460,112                               
                                                                                     
                                      ON BRIEF                                        
                                                                                     
          Before KIMLIN, GARRIS and JEFFREY T. SMITH, Administrative Patent           
          Judges.                                                                     
          KIMLIN, Administrative Patent Judge.                                        



                                 DECISION ON APPEAL                                   
               This is an appeal from the final rejection of claims 1-14.             
          Claim 1 is illustrative:                                                    
          1.   A method for forming a shallow trench isolation using a SiON           
          anti-reflective coating which eliminates water spot defects,                
          comprising the steps of:                                                    
               a.  forming a pad oxide layer over a substrate;                        
               b.  forming a silicon nitride layer on said pad oxide layer;           

                                         -1-                                          




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