Ex Parte ISHIKAWA et al - Page 2



          Appeal No. 2004-1357                                                        
          Application 09/587,281                                                      

                                   THE INVENTION                                      

               The invention relates to “a method for cutting an obverse              
          protecting sheet that is used for a semiconductor wafer when                
          machining with a back grinder” (specification, page 1).                     
          Representative claim 4 reads as follows:                                    
               4.  A method for cutting a protecting sheet of a wafer                 
          having a first face and a second face, wherein the first face has           
          a level part, wherein a chamfered inclined surface is provided at           
          a periphery of the wafer, and wherein the first face is                     
          substantially covered by the protecting sheet, the protective               
          sheet extending over the chamfered inclined surface and the                 
          second face is to be subjected to backgrinding, comprising the              
          step of:                                                                    
               cutting protecting sheet so that a diameter of the                     
          protecting sheet is at least equal to a diameter of the level               
          part of the first face and smaller than an outer diameter of the            
          wafer, and removing the protecting sheet from at least part of              
          the chamfered including surface;                                            
               wherein the step of cutting further comprising the step of:            
          arranging a cutting tool at an inclined angle relative to the               
          first face while cutting so that a cut face of the protecting               
          sheet and the level surface of the first surface form an obtuse             
          angle; and wherein the inclined angle of the cutting tool is                
          adjusted according to a form of the chamfered part of the wafer             
          and a finishing thickness of the wafer.                                     






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