Ex Parte Hower et al - Page 2



            Appeal No. 2005-0814                                                                       
            Application No. 10/036,323                                                                 

                  The appealed claims are directed to an n-channel DMOS                                
            (“double diffused” metal oxide semiconductor) transistor                                   
            structure.                                                                                 
                  Claim 14, the sole independent claim, is illustrative of the                         
            subject matter embraced by the appealed claims:                                            
                  14.    An n-channel DMOS transistor source structure,                                
                  comprising:                                                                          
                        an n-type source diffusion, ohmically connected to a                           
                  source metallization;                                                                
                        a p-type surface body diffusion which laterally                                
                  surrounds at least part of said source diffusion;                                    
                        a conductive gate structure which is capacitively                              
                  coupled to part of said p-type surface body diffusion to                             
                  define a channel region therein;                                                     
                        a p-type buried body diffusion which underlies said                            
                  channel and at least part of said surface body diffusion;                            
                  and                                                                                  
                        an ohmic connection between said buried body                                   
                  diffusion and said source metallization;                                             
                        whereby said buried body diffusion diverts hole                                
                  current to bypass said source diffusion, and thereby reduces                         
                  emission of secondary electrons, and thereby increases the                           
                  safe operating area of the device.                                                   
                  The prior art references relied upon by the examiner are:                            
            Mena et al. (Mena)           4,922,327             May   1, 1990                           
            Huang                        6,437,399 B1          Aug. 20, 2002                           
            (effective filing date: Jun. 30, 1997)                                                     


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