Ex Parte Yanagisawa et al - Page 1



              The opinion in support of the decision being entered today was not      
              written for publication and is not binding precedent of the Board.      


                      UNITED STATES PATENT AND TRADEMARK OFFICE                       
                                     __________                                       
                         BEFORE THE BOARD OF PATENT APPEALS                           
                                  AND INTERFERENCES                                   
                                     __________                                       
                 Ex parte MICHIHIKO YANAGISAWA, KAZUYUKI TSURUOKA                     
                                  and CHIKAI TANAKA                                   
                                     __________                                       
                                Appeal No. 2005-0900                                  
                             Application No. 10/098,588                               
                                     __________                                       
                                      ON BRIEF                                        
                                     __________                                       

          Before HAIRSTON, KRASS and JERRY SMITH, Administrative Patent               
          Judges.                                                                     
          JERRY SMITH, Administrative Patent Judge.                                   

                                 DECISION ON APPEAL                                   
          This is a decision on the appeal under 35 U.S.C. § 134                      
          from the examiner’s rejection of claims 2, 3, 8 and 9, which                
          constitute all the claims pending in the application.                       
          The disclosed invention pertains to a local dry etching                     
          apparatus for removing unevenness on a surface of a semiconductor           
          wafer.                                                                      






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