Appeal No. 2006-1820
Application No. 08/889,440
with the information set by the kinetic condition setting unit and computes motion of the
generated adsorbate particles, to simulate phenomena of said particle formed of adsorbate
particles and substrate particles, each adsorbate particle having a corresponding emission source
wherein
for each adsorbate particle, the kinetic condition setting unit sets a region
indicating a position of the corresponding emission source, and
the particle motion computing unit generates each adsorbate particle in accordance
with the position of the corresponding emission source.
The examiner relies on the following references:
Misaka et al. (Misaka) 5,421,934 Jun. 6, 1995
Ohira et al. (Ohira), "Molecular-dynamics Simulations of Hydrogenated Amorphous
Silicon Thin-Film Growth," Paper presented at the Fall Meeting of the Materials
Research Society, Boston, U.S.A., pp. 1-6, November 1995.
Baumann et al. (Baumann), "3D Modeling of Sputter and Reflow Processes for
Interconnect Metals," IEEE IEDM, pp. 4.4.1-4.4.4, 1995.
Yamada et al. (Yamada), "A Sputter Equipment Simulation System Including Molecular
Dynamical Target Atom Scattering Model", IEEE IEDM, pp. 4.5.1-4.5.4, 1995.
Husinsky, et al. (Husinsky), "Fundamental aspects of SNMS for thin film
characterization: Experimental studies and computer simulations", Thin Solid Films,
Vol. 2, pp. 289-309, January 15, 1996.
Kinema/SIM Manual, published by ArSciMed, 1996.
Reeves, "Particle System – A Technique for Modeling a Class of Fuzzy Objects", ACM
transactions on Graphics, pp. 91-108, April 1983.
Cohen, "Computer Animations, Quantum Mechanics and Elementary Particles",
Europhys. News, pp. 163-166, 1992.
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