Ex Parte Ferranti et al - Page 2

                Appeal 2006-2350                                                                                 
                Application 10/444,104                                                                           
                                              INTRODUCTION                                                       
                       The claims are directed to a method of polishing a glass or glass-                        
                ceramic substrate using a particular aqueous slurry composition that retards                     
                hard settling.  Slurry compositions normally used to polish glass or glass-                      
                ceramic substrates contain abrasive particles dispersed in deionized water                       
                and/or other liquids (Specification ¶ 0004).  Cerium oxide is a commonly                         
                used abrasive in such slurry compositions (id.).  Unfortunately, cerium oxide                    
                abrasives tend to hard settle, i.e., the abrasive particles fall out of the                      
                dispersion and cannot be redispersed (Specification ¶ 0005).  Hard settling                      
                results in a sludge that clogs pipes and processing equipment, a condition                       
                that is highly problematic in an industrial operation (id.).  Appellants’                        
                Specification describes a number of additives useful for retarding hard                          
                settling among which is a combination of sodium alginate with a divalent                         
                metal salt, such as a calcium salt (Specification ¶¶ 0007 and 0022).  Claim                      
                19 is illustrative of the subject matter on appeal:                                              
                       19.  A method of polishing a glass or glass-ceramic substrate                             
                comprising introducing an aqueous slurry composition between a polishing                         
                pad and the substrate when the polishing pad and substrate are pressed into                      
                contact with each other and moving relative to each other, wherein the                           
                aqueous slurry composition comprises from about 1% to about 20% by                               
                weight of a solids portion comprising:                                                           
                       abrasive particles, the abrasive particles comprising high purity                         
                             cerium oxide and/or cerium-containing mixed rare earth oxides,                      
                             provided that the amount by weight of cerium oxide present as                       
                             a percent of the total rare earth oxide is greater than or equal to                 
                             50%;                                                                                
                       a polyacrylate in an amount within the range of from about 0.5% to                        
                             about 10% by weight of the solids portion;                                          
                       sodium alginate in an amount within the range of from about 0.1% to                       
                             about 10% by weight of the solids portion; and                                      

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