Appeal 2007-0918
Application 10/931,868
a deposition chamber;
a vessel comprising a precursor composition comprising two or more
miscible liquid complexes of the formula;
LyMYz
wherein:
M is a metal;
each L group is independently a neutral ligand containing one
or more Lewis-based donor atoms;
each Y group is independently an anionic ligand;
y= a nonzero integer; and
z= a nonzero integer corresponding to the valence state of the
metal; and further wherein there are at least two different L groups
present in the precursor composition.
The Examiner has relied upon the following prior art reference as
evidence of unpatentability:
Baum US 5,919,522 Jul. 6, 1999
Claims 1-30 stand rejected under 35 U.S.C. § 102(e) as anticipated by
Baum (Answer 3).
Appellant contends that the chemical vapor deposition apparatus of
Baum does not include a vessel comprising a precursor composition as
specified in the claimed invention (Br. 5).
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