Appeal 2007-1170
Application 10/971,698
formation of the vapor cloud is caused by a vapor pressure Pv of
vaporized Alq which is significantly higher than a reduced
pressure Pc in the chamber C.
(Freeman 013 at 10:[0149] (emphasis added).)
Other references
34. We find no need to describe the other references separately.
The rejection
35. The Examiner finds, and Freeman does not dispute, that Freeman 013
is available as prior art under 35 U.S.C. § 102(b) against the Specification.
(Answer at 5–6.)
36. The Examiner finds that Freeman 013 discloses all structures and
properties required by the claims on appeal but for the ratio of the interior
volume of the housing to the volume between the baffle and the cover.
(Answer at 5.)
37. The Examiner finds that Spahn teaches that the placement of an
internal baffle between the source of the evaporating material and the exit
slit of the evaporation container is an important variable in the design of
vapor deposition devices such as those taught by Freeman 013, Hanson, and
Shen. (Answer at 6.)
38. The Examiner finds that the placement of the internal baffle is
recognized in the art as a result-effective variable and concludes that the
placement of the baffle close to the aperture such that the recited volume
ratio is met would have been obvious. (Answer at 6.)
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