Ex parte BEASOM - Page 3




          Appeal No. 96-1584                                                          
          Application 08/066,697                                                      


               wherein said PN junction is spaced apart from said sidewalls           
          of said semiconductor island region, and said material capable of           
          distributing a voltage applied thereto is coupled to receive a              
          prescribed bias voltage that is insufficient to cause the                   
          avalanche-generation of electron-hole pairs in the vicinity of              
          said relatively high-to-low impurity concentration junction.                
               24.  A semiconductor device comprising:                                
               a semiconductor substrate containing a semiconductor island            
          region of a first conductivity type having sidewalls which abut a           
          first side of dielectric material that prescribes said island               
          region, a second side of said dielectric material being                     
          contiguous with material capable of distributing a voltage                  
          applied thereto;                                                            
               a first semiconductor region of said first conductivity                
          type, and having an impurity concentration different from that of           
          said island region, disposed in said island region and defining a           
          relatively high-to-low impurity concentration junction between              
          said semiconductor region and said island region, said relatively           
          high-to-low impurity concentration junction intersecting said               
          dielectric material at a sidewall of said semiconductor island              
          region, said relatively high-to-low impurity concentration                  
          junction corresponding to a readily measurable transition of                
          doping concentration within said island region, as opposed to a             
          graded profile from high-to-low doping such as a Gaussian                   
          distribution from a top surface of said island region toward the            
          bottom of said island region or a low-to-high retrograde profile            
          measured from said top surface of said island region;                       
               a second semiconductor region of a second conductivity type            
          disposed in said island region and defining a PN junction between           
          said second semiconductor region and said island region, said               
          island region and said second semiconductor region being coupled            
          to receive respective bias voltages which reverse bias said PN              
          junction; and                                                               
               wherein said PN junction is spaced apart from said sidewalls           
          of said semiconductor island region, and said material capable of           
          distributing a voltage applied thereto is coupled to receive a              
          prescribed bias voltage, said prescribed bias voltage having a              
          value such that, when said material capable of distributing a               
          voltage applied thereto is biased at said prescribed bias                   
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