Ex parte TELFORD et al. - Page 5




              Appeal No. 1996-0200                                                                                         
              Application 08/119,444                                                                                       




              meaning of the words in their ordinary usage as they would be understood by one of                           
              ordinary skill in that, taking into account whatever enlightenment by way of definitions or                  
              otherwise that may be afforded by the written description contained in the applicant’s                       
              specification.  [emphasis added]  In re Morris, 127 F.3d 1048, 1054,                                         
              44 USPQ2d 1023, 1027 (Fed. Cir. 1997).                                                                       
                     During prosecution of the application, the examiner gave the term “susceptor” no                      
              weight alleging that the term “does not specifically give ‘life and breath’ to the claim to                  
              distinguish one aluminum substrate from another.”  Answer, page 19.  On the other hand,                      
              appellants urge that the term “susceptor” has a specific meaning as defined in their                         
              specification.  We agree with the appellants.                                                                
                     In our view, the term “susceptor” contributes to the definition of the claimed                        
              invention.  Bell Communications Research, Inc. v. Vitalink Communications,                                   
              55 F.3d 615, 620, 34 USPQ2d 1816, 1820 (Fed. Cir. 1995).                                                     
                     Appellants state:                                                                                     
                            In the formation of integrated circuit structures, certain processes                           
                     such as plasma-assisted chemical vapor deposition processes are carried                               
                     out in a vacuum chamber of a reactor wherein the wafer is mounted on a                                
                     platform referred to as a susceptor which usually serves not only as a                                
                     support for the wafer, but also as one of the electrodes for generation of the                        
                     plasma.  Specification page 1.                                                                        



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