Appeal No. 1997-0106
Application 07/792,482
(a) applying a layer of an antihalation composition on
the substrate, the antihalation composition comprising an
alkali soluble thermoplastic phenolic resin binder selected
from the group consisting of novolak resins and polyvinyl
phenols in an amount of from 50 to 90 weight percent of the
composition on a dry solids basis and a thermal crosslinker
compound in an amount sufficient to crosslink the composition;
(b) in the absence of a photoimaging step, at least
partially thermally crosslinking the antihalation composition
layer;
(c) applying a layer of a photoresist composition over
the antihalation composition, the photoresist composition
comprising an alkali soluble thermoplastic phenolic resin
binder selected from the group consisting essentially of
novolak resins and polyvinyl phenols in an amount sufficient
to form a film and a radiation sensitive component in an
amount sufficient to enable development of the photoresist
following exposure to activating radiation;
(d) exposing the photoresist composition to patterned
activation radiation;
(e) baking the exposed photoresist layer to cause a
crosslinking reaction between the photoresist and antihalation
layers;
(f) developing the baked, exposed photoresist layer; and
(g) in the absence of a photoimaging step, removing the
bared antihalation layer, and
(h) altering the underlying substrate.
The following rejections are at issue in this appeal:1
(1) Claims 36-39, 44-47, 49-58, 60, 61, 63, 66-68 and 70
are rejected under 35 U.S.C. § 112, first paragraph, based on
written description.
1Additionally, the examiner rejected claim 36 under 35 U.S.C. § 112, second
paragraph, for failing to provide antecedent basis for the "annihilation layer" of step
(g) and claim 66 under 35 U.S.C. § 112, second paragraph, in view of several
misspellings. However, these rejections have been withdrawn by the examiner. See
Answer, p. 3.
2
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