Ex parte MALHI - Page 2




          Appeal No. 1997-1624                                                            
          Application No. 08/384,816                                                      


          examiner indicated that claim 24 is now allowable.                              
          Accordingly, only claims 19 through 23 and 25 remain before us                  
          on appeal.                                                                      
               Appellant's invention relates to vertical transistors                      
          having a noncontinuous isolation layer and first and second                     
          insulating portions extending from the top and bottom surfaces                  
          of the semiconductor substrate, respectively, to the                            
          noncontinuous layer for isolating adjacent transistors.  Claim                  
          19 is illustrative of the claimed invention, and it reads as                    
          follows:                                                                        
               19. A vertical transistor, comprising:                                     
               a semiconductor substrate having top and bottom surfaces;                  
               a noncontinuous isolation layer in the semiconductor                       
          substrate between the top surface and the bottom surface;                       
               a source region formed in the top surface of the                           
          semiconductor substrate above the noncontinuous isolation                       
          layer;                                                                          
               a gate electrode formed above the source region;                           
               a first insulating material extending from the top                         
          surface of the semiconductor substrate to the noncontinuous                     
          isolation layer;                                                                
               a drain region formed in the semiconductor substrate, a                    
          portion of the noncontinuous isolation layer extending into                     
          the drain region; and                                                           

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