Appeal No. 1997-3051
Application No. 08/473,963
compound (dissolution inhibitor) which contains acid cleavable groups. (See pages 2-5).
The dissolution inhibitor is decomposed by acid liberated from an onium salt, when the
composition is exposed to radiation.
Nguyen-Kim discloses photosensitive compositions comprising a combination of
(i) a compound which generates an acid when exposed to activating radiation, (ii) a
compound (dissolution inhibitor) which contains acid cleavable groups and (iii) a binder.
(Column 2, lines 28-56). The dissolution inhibitor compound (ii) ester groups are
decomposed by the acid liberated from the compound (i). (Column 5, line 55 to column
6, line 58).
Elsaesser discloses positive photosensitive compositions comprising a
combination of (i) a compound which generates an acid when exposed to activating
radiation and (ii) a compound (dissolution inhibitor) which contains acid cleavable groups.
(Column 2, lines 12-36). The dissolution inhibitor composition is a 1,2-quinone diazide
compound and/or a combination of a compound which forms a strong acid when exposed
to actinic radiation and a compound containing at least one acid cleavable C-O-C bond.
(Column 5, line 50 to column 6, line 31). Thus, the dissolution inhibitor contains at least
one acid-cleavable ether bond which is decomposed by the acid liberated from the acid
generating compound.
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Last modified: November 3, 2007