Appeal No. 2000-1846
Application No. 08/709,879
mechanism required in the Murata system. Also, inasmuch as the
resist of Murata is superior in developability, it is not clear
that Murata is not directed to enhanced solubility. The
declaration offers little more than a description of the Kihara
mechanism and the characterization of Murata as directed to an
improvement in process stability. In fact, the resist of Murata
is characterized as
superior in developability, pattern form, resolution,
focused tolerance and yield of residual film fitness,
has good process stability, and can be suitability used
even in irradiation with, in particular, a radiation
having a wavelength equal to or smaller than far
ultraviolet rays, for example, an excimer laser or the
like” (page 1).
Appellants also rely upon the Hayashi Declaration of March
16, 1998 which demonstrates that resist patterns using the
composition of the present invention exhibit a better taper angle
than patterns made from the Murata composition, and that the
instant composition exhibited no film thinning, “whereas some of
the resist patterns formed from the reference were observed to
exhibit film thinning” (page 5 of principal brief, last
paragraph). However, we must agree with the examiner’s analysis
that the declaration data is hardly commensurate in scope with
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