Ex Parte ZHENG - Page 5




                    Appeal No. 2002-2223                                                                                              
                    Application No. 09/475,891                                                                                        


                    Datapoint Corp., 908 F.2d 931, 934, 15 USPQ2d 1321, 1323 (Fed. Cir. 1990) (It is                                  
                    insufficient that the prior art disclosed the components of the patented device, either                           
                    separately or used in other combinations; there must be some teaching, suggestion,                                
                    or incentive to make the combination made by the inventor.); Uniroyal, Inc. v.                                    
                    Rudkin-Wiley Corp., 837 F.2d 1044, 1044, 1051, 5 USPQ 1434, 1438 (Fed. Cir.                                       
                    1988).                                                                                                            
                            The Examiner rejected claims 12 to 14 under 35 U.S.C. § 103(a) as                                         
                    unpatentable over the combination of Lee and Maniar.  The Examiner has found that                                 
                    Lee teaches a method for etching that differs from the claimed invention in the step                              
                    of etching an anti-reflective layer.  To remedy this deficiency the Examiner relied on                            
                    Maniar.  According to the Examiner, Maniar teaches that anti-reflective layers are                                
                    used over a polysilicon layer and under a resist.  (Answer, p. 2).  Maniar discloses                              
                    that the anti-reflective coating alleviates the problems associated with unwanted                                 
                    reflectance of radiation during lithography operations.  (Col. 4).  Maniar further                                
                    discloses that the anti-reflective layer can be etched with a wet etch or gas mixture                             
                    containing CF4.  Thus, a person of ordinary skill in the art would have been                                      
                    motivated to include an anti-reflective layer in the semiconductor device of Lee in                               
                    order to alleviate the problems associated with unwanted reflectance.  A person of                                
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