Appeal No. 2002-0514
Application No. 08/886,388 Page 2
44. A pair of adjacent stacked capacitors fabricated using
a photolithographic process having a characteristic minimum
photolithographic feature dimension on a semiconductor substrate,
the adjacent stacked capacitors respectively including a lower
plate having a minimum lateral spacing from one another which is
less than the minimum photolithographic feature dimension, each
lower plate including a polysilicon plug having a diameter less
than the minimum photolithographic feature dimension.
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
Lee 5,684,316 Nov. 04, 1997
Morihara et al. (Morihara), “Disk-Shaped Stacked Capacitor Cell
for 256 Mb Dynamic Random-Access Memory,” Japanese Journal of
Applied Physics, Vol. 33, Pt. 1, No. 8 (1994).
Wolf et al. (Wolf), "Silicon Processing for the VLSI Era,"
Volume 1: Process Technology, Lattice Press (1986), p. 493.
Claims 44, 45, 51-54, 56, 58-60, 62 and 66-68 stand rejected
under 35 U.S.C. § 112, second paragraph as being indefinite for
failing to particularly point out and distinctly claim the
subject matter which applicant regards as invention. Claims 44,
45, 51-54, 56, 58-60, 62 and 66-68 stand rejected under 35 U.S.C.
§ 112, first paragraph as containing subject matter which was not
described in such a way as to enable one skilled in the art to
which it pertains, or with which it is most nearly connected, to
make and/or use the invention. Claims 44, 45, 51-54, 56, 58-60,
62 and 66-68 stand rejected under 35 U.S.C. § 103 as being
unpatentable over Lee in view of Wolf and Morihara.
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