The opinion in support of the decision being entered today was not written
for publication and is not binding precedent of the Board.
Paper No. 19
UNITED STATES PATENT AND TRADEMARK OFFICE
____________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
____________
Ex parte DAWN M. HOPPER, MINH V. NGO, and MARK S. CHANG
____________
Appeal No. 2004-0660
Application No. 10/120,116
____________
ON BRIEF
____________
Before GARRIS, WARREN, and MOORE, Administrative Patent Judges.
GARRIS, Administrative Patent Judge.
DECISION ON APPEAL
This is a decision on an appeal from the final rejection of
claims 1-11. The only other claims remaining in the application,
which are claims 12-18, stand withdrawn from further consideration
by the Examiner.
The subject matter on appeal relates to a method for filling
isolation trenches during a semiconductor fabrication process by
depositing a silicon-rich liner onto the isolation trenches and
filling the isolation trenches with an oxide utilizing a biased
high density plasma deposition process. This appealed subject
Page: 1 2 3 4 5 6 7 8 9 10 11 12 13 14 Next
Last modified: November 3, 2007