Ex Parte Wheat et al - Page 5




         Appeal No. 2004-2027                                                       
         Application No. 09/670,189                                                 



         appealed claim 1 or 12.                                                    
              We cannot agree with the examiner’s analysis and conclusion.          
              Warnes discloses a method of making CVD [chemical vapor               
         deposition] active element modified platinum aluminide diffusion           
         coatings on a nickel or cobalt base superalloy substrate, wherein          
         a platinum layer is first deposited on the substrate and then              
         Al+Si+Hf+ optionally Zr and/or other active elements are CVD               
         codeposited to produce diffusion coatings useful in, e.g.,                 
         service applications in the hot turbine section of a gas turbine           
         aircraft engine.  (Column 2, lines 55-64.)  Warnes further                 
         teaches:                                                                   
              The substrate first was electroplated with Pt (9-11                   
              milligrams/centrimeter [sic] squared) as described                    
              above without any diffusion heat treatment of the                     
              platinum layer prior to CVD codeposition...The second                 
              step was conducted at a substrate temperature of 1080º                
              C. using coating gas mixture comprising 4 volume %                    
              silicon tetrachoride [sic] and aluminum trichloride                   
              (greater than 90% by volume aluminum trichloride), 79.5               
              volume % hydrogen, 15 volume % Ar, and 1.5 volume %                   
              HfCl4 and ZrCl4 [(coating gas flow rate of 200 standard               
              cubic feet per hour (scfh) and total pressure of 150                  
              Torr].  The coating gas mixture was generated by                      
              passing high purity hydrogen (e.g. less than 30 ppb                   
              impurities) and high purity hydrogen chloride (e.g.                   
              less than 25 ppm impurities) in mixture of hydrogen/10                
              volume % HCl over a high purity 99.999% pure source of                
              aluminum and then passing the mixture over a high                     
              purity 99.999% pure source of silicon with both sources               
              at 290º C. (sources external of retort) to form a                     
              mixture of aluminum trichloride and silicon                           
              tetratrichloride [sic] as disclosed in copending                      
              application Ser. Nos. 08/197,349 and 08/197,497 of                    
              common assignee herewith, the teachings of which are                  
              incorporated herein by reference to this end.  A                      

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