Ex Parte Manginell et al - Page 3



         Appeal No. 2005-0237                                                       
         Application No. 10/165,861                                                 
         rejections, we refer to the brief and reply brief and to the               
         answer for a complete exposition thereof.                                  
                                      OPINION                                       
              For the reasons which follow, we cannot sustain any of the            
         above noted rejections.                                                    
              Concerning the section 102 rejection based on the IBM                 
         reference, the examiner regards organic coating 3 of this                  
         reference as corresponding to the here claimed etching delay               
         layer and accordingly finds appealed claim 1 to be anticipated by          
         the reference.  As correctly argued by the appellants, however,            
         the IBM reference contains no teaching that the organic coating 3          
         thereof is applied via a deposition and patterning step as                 
         required by claim 1.  To the contrary, Figure 2 of this reference          
         shows the organic coating 3 as a non-patterned layer and thereby           
         militates against the examiner’s belief that coating 3 is applied          
         via a patterning technique as here claimed.                                
              Additionally, we agree with the appellants that the                   
         planarized surface achieved by way of organic coating 3 cannot be          
         regarded as satisfying the feature requirement of appealed claim           
         1.  That is, the IBM reference does not satisfy the claim 1                
         limitation “the thickness and location of said etching delay               
         layer being chosen to control the depth of features formed in the          

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