Appeal No. 2006-0378 6
Application No. 10/052,703
We, therefore, find that the Examiner has failed to
establish anticipation of the subject matter of claim 1 and
claims 2-8 dependent thereon within the meaning of
35 U.S.C. § 102 because the Examiner has not shown that each and
every limitation is met by the shower head of Chen.
Turning to claim 9, this claim is directed to an apparatus
including a heater stage located in a lower portion of a process
chamber and a separating device arranged between a bottom of the
process chamber and a bottom of the heater stage. Claim 9 reads
as follows:
9. An apparatus for forming a thin film, said
apparatus comprising:
a process chamber;
a heater stage located in a lower
portion of the process
chamber, said heater
stage configured to
support a wafer and to
heat the wafer to a high
temperature;
a shower head located in an upper portion of the
process chamber, said shower head configured to supply
a reaction gas to the wafer; and
a separating device arranged between a bottom of
the process chamber and a bottom of the heater stage,
said separating device configured to separate the
heater stage from the bottom of the process chamber and
to reduce a volume of processing space within the
process chamber.
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