Appeal No. 2001-0113
Application No. 08/604,751
Fig. 16) and an insulative spacer (150) are interposed between
the first (125) and second (170) conductivity plugs. The total
width of the second conductive plug (170) and insulative spacer
(150) is approximately no greater than a minimum
photolithographic limit (F). See Appellants' specification,
Fig. 14 and Fig. 11B, and also page 15, line 22 through page 16,
line 7.
Claims 12 and 13 are the only claims pending before us on
appeal. Claims 12 and 13 are reproduced as follows:
12. A memory device, comprising:
a first conductive plug having a first type conductivity and
having a width approximately equal to a minimum photolithographic
limit;
a second conductive plug having a second type conductivity;
and
an insulative spacer interposed between said first and said
second conductive plugs wherein a total width of said second
conductive plug and said spacer is approximately no greater than
a minimum photolithographic limit.
13. A memory device, comprising:
two first conductive plugs having a first type conductivity
distanced one from the other by a maximum distance approximately
equal to a minimum photolithographic limit;
2
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