Appeal No. 2005-0536
Application No. 09/940,788
surface area of the supply ports cumulatively is greater at the
outer periphery of the showerhead than at the center thereof"
(page 4 of Answer, last paragraph). We agree with the examiner
that "the operation of the Cady apparatus inherently discloses a
3:1 ratio of gas volume" at the periphery relative to the center
(id.).
Appellants contend at page 4 of the Reply Brief that the 3:1
ratio of gas volume at the periphery to the center of the wafer
results in the inert gas being supplied uniformly to the wafer
surface, which is in contradistinction to the claimed method of
non-uniform supply to the peripheral and central portions of the
wafer. However, appellants' argument is not germane to the
claimed subject matter on appeal. The claimed method does not
require non-uniform gas-flow across the wafer surface. The
appealed claims only require that the supply of inert gas is
greater at the periphery than at the center. In accordance with
the Figure 1 submitted by appellants at page 4 of the Reply
Brief, since the outer peripheral portion is three times as large
as the center portion, uniform supply of gas through the
apertures results in the claimed larger amount of gas supplied to
the peripheral portion. Appellants are not claiming a greater
amount of gas flow per unit area at the peripheral portion.
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