Appeal No. 2005-0536
Application No. 09/940,788
the center portion. Manifestly, such supply of inert gas
inherently results from the Cady apparatus depicted in Figure 8B.
Concerning the separately argued limitation of claim 2 that
"a sealed drying space is formed at the outer peripheral portion
of the face of the wafer," we agree with the examiner that the
sealed system discussed by Cady at column 7, lines 44-58 meets
the claim requirement for the sealed drying space. Although
Cady's structure for providing the sealed drying space at the
outer peripheral portion of the wafer is different than the
structure depicted in appellants' specification, appellants'
disclosed structure is not at issue. Cady provides a sealed
drying space at the outer peripheral portion of the wafer by
affecting a flow path that always contains fluid which removes
entrained and undesirable gases. When the apparatus of Cady is
in operation the outer peripheral portion of the face of the
wafer is sealed by the flow of inert gas.
In conclusion, based on the foregoing and the reasons well-
stated by the examiner, the examiner's decision rejecting the
appealed claims is affirmed.
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