Appeal No. 94-4428
Application 08/024,034
1. A method of producing a spallation-resistant
protective layer on the surface of a nickel- or cobalt-based
superalloy substrate, said method comprising the steps of:
depositing an adherent metal aluminide layer on
said substrate, the metal aluminide in said layer being nickel
or cobalt aluminide;
depositing an aluminum oxide layer on the
surface of said metal aluminide layer; and
heating said aluminum oxide layer.
The references of record relied upon by the examiner are:
Lory et al. (Lory) 4,675,089 Jun. 23, 1987
Strangman et al. (Strangman) 4,880,614 Nov. 14,
1989
Morosanu, Thin Films Science and Technology, 7, ?Thin Films by
Chemical Vapour Deposition?, pages 429-430 and 445 (1990).
Kiyono et al. (Kiyono) 59-181318 Oct. 15, 1984
(Japanese Kokai Patent)
Claims 1 through 3 and 6 through 8 stand rejected under
35 USC § 103 over Strangman in view of Lory. Claims 4 and 5
stand similarly rejected under the same section of the statute
further in view of Morosanu. Additionally, claims 9 through
11 stand rejected under 35 USC § 103 in view of the combined
teachings of Strangman, Lory, and Kiyono.
2
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