Appeal No. 1998-2422
Application 08/488,380
DECISION ON APPEAL
This is a decision on appeal under 35 U.S.C. § 134 from
the final rejection of claims 77-88.
We reverse.
BACKGROUND
The disclosed invention relates to a method and apparatus
for aligning a membrane lithographic fabrication tool as
described in the specification at page 76, line 29, to
page 83, line 3, with respect to figures 28a, 28b, 29l, 29m,
29n, 29p, 30, and new figures 33-35.
Claim 77 is reproduced below.
77. A method of aligning a membrane lithographic
fabrication tool comprising a low-stress deposited
dielectric layer to a semiconductor substrate to be
exposed by the tool, comprising the steps of:
providing a first conductive coil pattern on a
surface of the semiconductor substrate;
applying electrical current to the first coil
pattern;
providing a second conductive coil on a surface
of the tool capable of sensing an electro-magnetic
field;
sensing an electro-magnetic field generated by
the first coil in the second coil; and
aligning the tool according to the signal sensed
by the second coil.
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