Appeal No. 95-3170
Application No. 07/813,749
photoresist having a non-linear optical property which
increases with respect to increasing light intensity, and (b)
exposing the photoresist using a reduction optical system with
a mask.
In addition to the admitted state of the prior art found
in the present specification, the examiner relies upon the
following reference as evidence of obviousness:
Diemeer et al. (Diemeer) 5,142,605 Aug. 25, 1992
(filed Sep. 7, 1989)
Appellants' claimed invention is directed to an exposed
photoresist formed by using a reduction optical system to
expose a photoresist having a non-linear optical property
which increases with respect to increasing light intensity.
According to appellants, "the exposed photoresist according to
the present invention obtains a high resolution of from 0.25-
0.35 Fm, even in a resist having a thickness of approximately
1 Fm" (page 3 of principal Brief).
Appealed claims 2-16 stand rejected under 35 U.S.C.
§ 112, first paragraph, as being based upon a non-enabling
disclosure. In addition, the appealed claims stand rejected
under 35 U.S.C. § 103 as being unpatentable over Diemeer in
view of the admitted prior art.
-2-
Page: Previous 1 2 3 4 5 6 7 Next
Last modified: November 3, 2007