Ex parte ROUNTREE et al. - Page 3




          Appeal No. 95-3592                                                          
          Application 08/109,203                                                      



          On page 7 of the specification, Appellants disclose that the                
          N-well isolation resistor 10 increases in resistance with an                
          increase in voltage to limit the amount of current supplied to              
          the protected circuit structure 21.                                         
                    Independent claim 1 is reproduced as follows:                     
                    1.  An isolation stage device for protecting a                    
          circuit structure against over-voltage conditions, comprising:              
                    a lightly doped region having a first conductivity                
          type formed in a lightly doped substrate having a second                    
          conductivity type;                                                          
                    a first heavily doped region formed at least par-                 
          tially in said lightly doped region having said first conduc-               
          tivity type, said first heavily doped region being electri-                 
          cally connected to a first input node;                                      
                    a second heavily doped region formed at least par-                
          tially in said lightly doped region having said first conduc-               
          tivity type, said second heavily doped region being electri-                
          cally connected to said circuit structure; and                              
                    a resistive means being electrically connected                    
          between said first heavily doped region and said second                     
          heavily doped region having a resistance responsive to the                  
          voltage between said first heavily doped region and said                    
          second heavily doped region.                                                
                    The reference relied on by the Examiner is as                     
          follows:                                                                    
          Shirato et al. (Shirato)          4,710,791          Dec. 1,                
          1987                                                                        



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