Appeal No. 95-3936
Application 08/135,324
examiner has indicated in his advisory action (Paper Number 24
- mailed on June 9, 1994) that claims 15 through 17 and 23
through 25 are allowed. Claim 11 has been objected to in the
advisory action without explanation of the basis for the
objection. Accordingly, only claims 10 and 12 through 14 are
before us for consideration and claims 11, 15 through 17 and
23 through 25 form no issue in this appeal.
THE INVENTION
The claimed invention is directed to a process for
forming a photoresist pattern. The process comprises the
conventional steps of coating a wafer with a photoresist,
irradiating the photoresist with radiation of a predetermined
wavelength to generate photoacid defining a latent image in
said photoresist and baking the latent image formed by the
photoacid. Appellants discovered that by protecting the latent
image formed on the photoresist on the wafer after generation
of photoacid but before baking the latent image a sharper,
better defined image is obtained.
Claim 10, the sole independent claim before us, is
reproduced below for a more facile understanding of
appellants' claimed invention.
10. A process for forming a photoresist pattern
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