Appeal No. 95-4850
Application 08/204,728
directed to allowable subject matter. Claim 12 was canceled.
Claim 1 reads as follows:
1. Apparatus for heating a substrate in a vacuum chamber, said apparatus comprising
a vacuum chamber having wall means with glass plate means therein,
substrate holding means inside the vacuum chamber,
lamp means outside said vacuum chamber, said lamp means emitting radiation in a first
wavelength range which passes through said glass plate means toward said substrate holding means,
and
heating disk means between said glass plate means and said substrate holding means, said
heating disk means having a high absorption of radiation in said first wavelength range and a high
emission of radiation in a second wavelength range above said first wavelength range.
The examiner’s Answer cites the following prior art:
Vu et al. (Vu) 4,581,520 Apr. 8, 1986
Stultz 5,047,611 Sept. 10, 1991
Goto (JP60-236216) 60-236216 Nov. 25, 1985
(Japan Patent)
Nakamu et al. (JP5-10677) 5-10677 Jan. 19, 1993
(Japan Patent)
Ono (JP62-94925) 62-94925 May 1, 1987
(Japan Patent)
OPINION
2
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