Appeal No. 1996-3816 Page 13
Application No. 08/293,331
PAK, Administrative Patent Judge, Dissenting
I respectfully dissent from the majority’s opinion. The
present application, which includes the appealed product-by-
process claims, is a division of an application containing
process claims, which matured into U.S. Patent 5,380,567.
Claim 1 of U.S. Patent 5,380,567, which was the subject of the
restriction requirement by the same examiner in the present
application, is reproduced below.
1. A method of forming a coating on an electronic device
consisting essentially of:
(A) coating the electronic device with a solution
consisting essentially of a solvent and hydrogen
silsesquioxane resin;
(B) evaporating the solvent to deposit a preceramic
coating on the electronic device; and
(C) heating the preceramic coating to a temperature
of between about 500E up to about 800EC. under an inert gas
atmosphere.
This claim recites process limitations which are closer to the
process limitations of the product-by-process claims in
question than the claims of U.S. Patent 5,370,904 issued to
Mine et al. For convenience, claim 1 of U.S. Patent 5,370,904
(Mine et al.) is reproduced below.
1. A method for the formation of a silicon oxide film
comprising:
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