Appeal No. 1998-1871 Page 2
Application No. 08/383,112
BACKGROUND
The appellant's invention relates to a semiconductor
processing apparatus capable of degassing a semiconductor
substrate in a vacuum chamber and also rotationally aligning
the substrate in the vacuum chamber. An understanding of the
invention can be derived from a reading of exemplary claims 1,
7 and 8, which appear in the appendix to the appellant's
brief.
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
Tezuka 4,771,730 Sep. 20,
1988
Perlov 5,421,893 June 6,
19952
Komiyama et al. 60-117714 3 June 25, 1985
(Komiyama) (Japan)
Matsuda 61-142743 4 June 30, 1986
2Effective filing date February 26, 1993.
3In determining the teachings of Komiyama, we will rely
on the translation provided by the appellant (see Paper No. 8,
filed September 16, 1996).
4In determining the teachings of Matsuda, we will rely on
(continued...)
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