Appeal No. 1998-2671
Application No. 08/480,543
refractory metal alone, wherein the deposition is performed so
that the alloy of aluminum and refractory metal substantially
fills the opening, and wherein the deposited aluminum forms a
layer without alloy above the opening, the deposited aluminum
layer without alloy having a planar upper surface.
The Examiner relies on the following references:
Schilling 4,107,726 Aug. 15, 1978
Mintz 4,661,228 Apr. 28, 1987
Tracy et al. (Tracy) 4,970,176 Nov. 13, 1990
(filed Sep. 29, 1989)
Chen et al. (Chen) 5,108,951 Apr. 28, 1992
(filed Nov. 05, 1990)
Stanley Wolf et al. (Wolf), “Silicon Processing for the VLSI Era,
Volume 1: Process Technology”, 367-371 (Lattice Press, Sunset
Beach, California, 1986).
The rejections of the appealed claims are set forth by the
Examiner as follows:
1. Claims 10-11, 13, and 18 stand finally rejected under
35 U.S.C. § 102(b) as being anticipated by Mintz.
2. Claims 3, 9-11, 13, and 18 stand finally rejected
under 35 U.S.C. § 103 as being unpatentable over Schilling in
view of Wolf.
3. Claims 3, 9-11, 13, and 18 stand finally rejected under
35 U.S.C. § 103 as being unpatentable over Schilling in view of
Tracy.
4. Claims 3, 10-12, and 18 stand finally rejected under
the judicially created doctrine of obviousness-type double
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