The opinion in support of the decision being entered
today was not written for publication and is not binding
precedent of the Board.
Paper No. 23
UNITED STATES PATENT AND TRADEMARK OFFICE
_______________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
_______________
Ex parte DAVID CHEUNG, JOE FENG,
JUDY H. HUANG and WAI-FAN YAU
______________
Appeal No. 2000-1004
Application 08/743,628
_______________
ON BRIEF
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Before WARREN, LIEBERMAN and TIMM, Administrative Patent Judges.
WARREN, Administrative Patent Judge.
Decision on Appeal
This is an appeal under 35 U.S.C. § 134 from the decision of the examiner finally
rejecting claims 1, 2, 9 through 11, 22, 24 and 25, and refusing to allow claims 15 and 23 as
amended subsequent to the final rejection. Claims 3 through 8 and 12 through 14 are also of
record and have been allowed by the examiner. Claims 1, 9 and 15 are illustrative of the claims
on appeal:
1. A method for reducing footing in a photoresist layer deposited on a substrate,
comprising the steps of:
depositing an antireflective layer comprising silicon, oxygen and nitrogen on the
substrate; and
depositing a capping layer on said antireflective layer, said capping layer having a
nitrogen content less than a nitrogen content of said antireflective layer.
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