Ex Parte SANDHU et al - Page 2


               Appeal No. 2000-1163                                                                                                   
               Application 08/649,262                                                                                                 

                       We find that, when considered in light of the written description in the specification as                      
               interpreted by one of ordinary skill in this art, see, e.g., In re Hyatt, 211 F.3d 1367, 1372, 54                      
               USPQ2d 1664, 1667 (Fed. Cir. 2000); In re Morris, 127 F.3d 1048, 1054-55, 44 USPQ2d 1023,                              
               1027 (Fed. Cir. 1997), In re Zletz, 893 F.2d 319, 321-22, 13 USPQ2d 1320, 1322 (Fed. Cir.                              
               1989), the plain language of appealed independent claims 1, 12, 22 and 28 require that the                             
               claimed methods for treating a metal-based residue in a semiconductor processing chamber                               
               comprise at least, as seen from appealed claim 1, (1) introducing a treatment gas into the                             
               processing chamber during a cleaning process, (2) permitting the treatment gas to interact with                        
               the metal-based residue to form a removable treatment product that is substantially stable when                        
               exposed to air as compared with the metal-based residue, and (3) opening the process chamber to                        
               remove the treatment product (emphasis supplied).  In appealed claim 22, the treatment gas is                          
               ammonia which forms an adduct salt with at least one chloride of titanium.  In appealed claim                          
               28, the treatment gas reduces the reactivity in air of the metal-based residue to produce a                            
               neutralized metal-based residue.  In all claims, the process chamber is opened to remove the                           
               treatment product.                                                                                                     
                       The dispositive issue in this appeal is whether one of ordinary skill in this art would have                   
               found in the prior art method as acknowledged at col. 1, line 46, to col. 2, line 25, of Eichman,                      
               these same three required method conditions of the appealed claims, for otherwise there is no                          
               factual foundation for the three grounds of rejection.  It is well settled that a reference stands for                 
               all of the specific teachings thereof as well as the inferences one of ordinary skill in this art                      
               would have reasonably been expected to draw therefrom, see generally, In re Fritch, 972 F.2d                           
               1260, 1264-65, 23 USPQ2d 1780, 1782-83 (Fed. Cir. 1992); presuming skill on the part of this                           
               person.  In re Sovish, 769 F.2d 738, 743, 226 USPQ 771, 774 (Fed. Cir. 1985).                                          
                       We have carefully considered the prior art method as acknowledged in Eichman in light                          
               of the positions advanced by the examiner (answer, pages 3-4 and 7-9) and appellants (brief,                           
               pages 6-9).  We must agree with appellants that the examiner has misinterpreted the prior art                          
               method as acknowledged in Eichman.                                                                                     
                       The cited passage reads in first pertinent part, “a portion of the reactant gases [TiCl4 and                   
               NH3] combine to form adduct salts of the reactants, such as white or yellow salts of TiCl4.NH3,                        


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