Appeal No. 2000-1664 Application No. 09/114,790 respective positions articulated by the appellants and the examiner. As a consequence of our review, we make the determinations which follow. McAllister discloses a method of forming a multilayer thin film structure which comprises a series of layers. The layers include a dialectric layer which has metal thereon and a top surface layer which has vias, chip connection pads, and via-pad connection staps thereon. McAllister does not disclose that the surface layer includes a plurality of orthogonal X conductor lines and Y conductor lines. Appellants argue that McAllister is silent with regard to the need for a plurality of orthogonal X conductor lines and Y conductor lines on the top surface of the MLTF. The examiner concludes that although McAllister does not expressly disclose the formation of orthogonal X and Y conductor lines, it is within the ordinary skill of the person of ordinary skill in the art given the teaching of McAllister that X and Y conductor lines could be formed (final rejection at page 3). The examiner also states, in the answer at page 3, that it is 3Page: Previous 1 2 3 4 5 6 7 NextLast modified: November 3, 2007