Appeal No. 2002-2223
Application No. 09/475,891
etching the remain silicon layer with a high-selectivity etch unit the
silicon oxide is exposed; and
over-etching the remaining silicon layer with a very high-selectivity
etch until silicon residues are cleared.
CITED PRIOR ART
As evidence of unpatentability, the Examiner relies on the following
references:
Goda et al. (Goda) 5,336,365 Aug. 09, 1994
Maniar et al. (Maniar) 5,525,542 Jun. 11, 1996
Lee et al. (Lee) 5,665,203 Sep. 09, 1997
Grimbergen et al (Grimbergen) 6,081,334 Jun. 27, 2000
(filed April 17, 1998)
The Examiner rejected claims 12 to 14 under 35 U.S.C. § 103(a) as
unpatentable over the combination of Lee and Maniar; claims 15, 16 and 20 under
35 U.S.C. § 103(a) as unpatentable over the combination of Lee and Maniar, as
applied to claims 12 to 14, further in view of Grimbergen; claim 18 under 35 U.S.C.
§ 103(a) as unpatentable over the combination of Lee and Maniar, as applied to
claims 12, further in view of Goda. (Answer pp. 2-3).
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