Appeal No. 1998-2619
Application No. 08/526,828
1. A method for adjusting gas flow in a flow-flange
reactor to achieve a desired thickness profile, comprising the
steps of:
establishing a target thickness profile;
determining a first set of optimum input-flow ratios in
response to said target thickness profile, based upon a first
plurality of sample thickness profiles and a first plurality
of sets of sample input-flow ratios, each of said sample
thickness profiles corresponding to one set of said first
plurality of sets of sample input-flow ratios;
calculating from said input-flow ratios a gas flow for
each of a plurality of gases supplied to said reactor; and
open-loop control adjusting gas flow to said reactor for
each of said plurality of gases to produce said calculated gas
flow.
10. A method for determining an input-flow ratio in a
flow-flange reactor to achieve a desired thickness profile on
a digital computer, comprising the steps of:
establishing a target thickness profile and storing data
representing said target thickness profile in memory;
calculating a first set of optimum input-flow ratios in
response to said target thickness profile, said input-flow
ratios being usable to calculate each of a plurality of gas
flows to said reactor for producing said desired thickness
profile in an open-loop control process, said input-flow
ratios being based upon data stored in said memory, said data
representing a first plurality of sample thickness profiles
and a first plurality of sets of sample input-flow ratios,
each of said sample thickness profiles corresponding to one
set of said first plurality of sets of sample input-flow
2
Page: Previous 1 2 3 4 5 Next
Last modified: November 3, 2007